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Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + UPW Rinsing, 60℃

guangdong Jietai Ultrasonic cleaning Equipment Co., Ltd.
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    Buy cheap Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + UPW Rinsing, 60℃ from wholesalers
     
    Buy cheap Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + UPW Rinsing, 60℃ from wholesalers
    • Buy cheap Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + UPW Rinsing, 60℃ from wholesalers

    Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + UPW Rinsing, 60℃

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    Brand Name : Jietai
    Model Number : JTM-100504AD
    Certification : CE, FCC, ROHS, etc.
    Price : ¥800000
    Payment Terms : T/T
    Supply Ability : One unit. It will take 30 to 60 days.
    Delivery Time : 30-60work days
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    Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + UPW Rinsing, 60℃

    Product Introduction: Semiconductor Silicon Wafer Cleaner
    A precision-engineered solution for semiconductor manufacturing, this ultrasonic cleaning system integrates multi-stage processes to achieve sub-micron level surface purity on silicon wafers—critical for maintaining device performance in advanced node fabrication (down to 5nm).
    Sequential Cleaning Stages:
    • Ultrasonic Alkaline Scrubbing: Employs 40KHz-80KHz ultrasonic cavitation in alkaline bath to decompose organic contaminants, strip photoresist residuals, and dislodge macro-particles (≥1μm) from wafer surfaces and via structures. The frequency-tunable ultrasonic energy ensures uniform cleaning across 4"-12" wafer diameters, including edge exclusion zones.
    • Ultrasonic Acid Etching: Utilizes the same frequency range in acidic media to dissolve inorganic impurities—specifically metal ions (Fe, Cu, Zn) and native oxide layers (SiO₂). Cavitation micro-jets penetrate patterned features to remove embedded sub-100nm contaminants, validated by particle counter readings (≤10 particles/wafer for ≥0.1μm).
    • UPW Rinsing: Final rinse with ultra-pure water (UPW, TOC ≤5ppb) flushes residual chemistries, achieving surface resistivity ≥18.2MΩ·cm—meeting SEMI F20 standards for pre-deposition cleaning.
    Process Parameters:
    • Frequency Band: 40KHz-80KHz (multi-frequency operation, selectable via HMI for contamination-specific tuning)
    • Temperature Setpoint: 60℃ (PID-controlled, ±1℃ tolerance) to optimize chemical reaction kinetics without inducing wafer warpage.
    • Material Compatibility: Wetted components in PFA (perfluoroalkoxy) and sapphire to prevent metallic ion leaching, ensuring zero cross-contamination.
    Fab Integration Advantages:
    • Compatible with FOUP/SMIF pod loading for automated cassette handling, reducing human intervention
    • Cleanroom-class design (ISO 5) with HEPA-filtered exhaust to maintain Class 1 environment compliance
    • Recipe storage for 50+ cleaning protocols, adaptable to bare wafers, SOI wafers, and epi-wafers
    Application: Essential for pre-litho, post-CMP, and post-etch cleaning in logic, memory, and MEMS fabrication lines.
    Keywords: Semiconductor wafer ultrasonic cleaner, alkaline-acid sequential cleaning, UPW rinsing, 40-80KHz, 60℃ process, sub-micron decontamination

    Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + UPW Rinsing, 60℃

    Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + UPW Rinsing, 60℃

    Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + UPW Rinsing, 60℃

    Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + UPW Rinsing, 60℃

    Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + UPW Rinsing, 60℃

    Quality Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + UPW Rinsing, 60℃ for sale
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