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40KHz-80KHz Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃

guangdong Jietai Ultrasonic cleaning Equipment Co., Ltd.
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    Buy cheap 40KHz-80KHz Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃ from wholesalers
     
    Buy cheap 40KHz-80KHz Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃ from wholesalers
    • Buy cheap 40KHz-80KHz Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃ from wholesalers

    40KHz-80KHz Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃

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    Brand Name : Jietai
    Model Number : JTM-100504AD
    Certification : CE, FCC, ROHS, etc.
    Price : ¥800000
    Payment Terms : T/T
    Supply Ability : One unit. It will take 30 to 60 days.
    Delivery Time : 30-60work days
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    40KHz-80KHz Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃


    Product Introduction: Semiconductor Silicon Wafer Cleaner
    Designed for high-precision cleaning in semiconductor manufacturing, this specialized system combines multi-stage ultrasonic processes to meet the rigorous surface purity demands of silicon wafers, directly impacting device reliability and production yield in microelectronics fabrication.
    Core Cleaning Procedures:
    • Ultrasonic Alkaline Cleaning: Employs ultrasonic cavitation in alkaline media to efficiently strip organic contaminants, photoresist residuals, and particulate debris from wafer surfaces and intricate structures (e.g., trenches, vias), creating a pristine substrate for subsequent processing steps.
    • Ultrasonic Acid Cleaning: Utilizes acid-based ultrasonic agitation to target and remove inorganic impurities, including metal ion contaminants (Fe, Cu, Ni) and native oxide layers, leveraging frequency-induced micro-jets to dislodge submicron particles from patterned or polished surfaces.
    • Pure Water Rinsing: Final stage utilizes ultra-pure water (UPW) with resistivity ≥18.2MΩ·cm for thorough rinsing, eliminating residual cleaning agents and ensuring surface inertness—critical for post-cleaning wafer handling and thin-film deposition.
    Technical Specifications:
    • Ultrasonic Frequency: 40KHz-80KHz (variable frequency output, allowing optimization of cavitation intensity for different contamination profiles and wafer sizes)
    • Operating Temperature: 60℃ (precision-controlled thermal environment to enhance chemical reactivity while maintaining wafer structural integrity)
    • Material Construction: Tanks and contact components made from PFA and high-purity quartz to resist chemical corrosion and prevent particle shedding, ensuring zero secondary contamination.
    Key Performance Advantages:
    • Delivers particle removal efficiency (PRE) of ≥99.9% for particles ≥0.1μm, compliant with SEMI standards for advanced node processing
    • Multi-frequency ultrasonic configuration adapts to bare wafers, epitaxial wafers, and patterned wafers (down to 7nm technology nodes)
    • 60℃ temperature regulation stabilizes chemical reaction kinetics, ensuring consistent cleaning results across batch operations
    • Compatible with automated wafer handling systems (SMIF pods, FOUPs) for seamless integration into fab workflows
    Application Scope: Essential for pre-lithography, post-CMP (Chemical Mechanical Polishing), and pre-metallization cleaning in 6-inch to 12-inch silicon wafer production lines.
    Keywords: Semiconductor wafer cleaning system, ultrasonic alkaline/acid treatment, pure water rinsing, 40-80KHz frequency, 60℃ process, silicon wafer decontamination
    This system provides a reliable solution for semiconductor manufacturers seeking to minimize defect rates and enhance process stability in high-volume wafer production.

    40KHz-80KHz Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃

    40KHz-80KHz Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃

    40KHz-80KHz Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃

    40KHz-80KHz Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃

    40KHz-80KHz Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃

    Quality 40KHz-80KHz Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃ for sale
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